DocumentCode
1290870
Title
Impact Ionization in InAs Electron Avalanche Photodiodes
Author
Marshall, Andrew R J ; David, John P R ; Tan, Chee Hing
Author_Institution
Dept. of Electron. & Electr. Eng., Univ. of Sheffield, Sheffield, UK
Volume
57
Issue
10
fYear
2010
Firstpage
2631
Lastpage
2638
Abstract
A systematic study of impact ionization, avalanche multiplication, and excess noise in InAs diodes has been carried out, confirming that avalanche multiplication is dominated by the impact ionization of electrons. This results in highly desirable “electron avalanche photodiode” characteristics previously only demonstrated in HgCdTe diodes, which are discussed in detail. The suppression of excess noise by nonlocal effects, to levels below the local model minimum of F = 2, is explained. An electron ionization coefficient is calculated and shown to be capable of modeling the electron impact ionization, which differs characteristically from that in wider bandgap III-V materials.
Keywords
avalanche photodiodes; impact ionisation; III-V materials; InAs; avalanche multiplication; electron avalanche photodiode; electron impact ionization; Avalanche photodiodes; Bandwidth; Electrons; Hyperspectral imaging; Impact ionization; Materials; Noise; Noise level; P-i-n diodes; Photonic band gap; Pollution measurement; Semiconductor device noise; Semiconductor diodes; Semiconductor materials; Avalanche photodiode (APD); InAs; electron avalanche photodiode (e-APD); impact ionization; ionization coefficient;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2010.2058330
Filename
5545385
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