• DocumentCode
    1290870
  • Title

    Impact Ionization in InAs Electron Avalanche Photodiodes

  • Author

    Marshall, Andrew R J ; David, John P R ; Tan, Chee Hing

  • Author_Institution
    Dept. of Electron. & Electr. Eng., Univ. of Sheffield, Sheffield, UK
  • Volume
    57
  • Issue
    10
  • fYear
    2010
  • Firstpage
    2631
  • Lastpage
    2638
  • Abstract
    A systematic study of impact ionization, avalanche multiplication, and excess noise in InAs diodes has been carried out, confirming that avalanche multiplication is dominated by the impact ionization of electrons. This results in highly desirable “electron avalanche photodiode” characteristics previously only demonstrated in HgCdTe diodes, which are discussed in detail. The suppression of excess noise by nonlocal effects, to levels below the local model minimum of F = 2, is explained. An electron ionization coefficient is calculated and shown to be capable of modeling the electron impact ionization, which differs characteristically from that in wider bandgap III-V materials.
  • Keywords
    avalanche photodiodes; impact ionisation; III-V materials; InAs; avalanche multiplication; electron avalanche photodiode; electron impact ionization; Avalanche photodiodes; Bandwidth; Electrons; Hyperspectral imaging; Impact ionization; Materials; Noise; Noise level; P-i-n diodes; Photonic band gap; Pollution measurement; Semiconductor device noise; Semiconductor diodes; Semiconductor materials; Avalanche photodiode (APD); InAs; electron avalanche photodiode (e-APD); impact ionization; ionization coefficient;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2010.2058330
  • Filename
    5545385