• DocumentCode
    1295459
  • Title

    Electromigration noise measurements using a novel AC/DC wafer-level noise measurement system

  • Author

    Yassine, Abdullah M. ; Chen, Charles Tsong-Ming

  • Author_Institution
    Dept. of Electr. Eng., Univ. of South Florida, Tampa, FL, USA
  • Volume
    44
  • Issue
    1
  • fYear
    1997
  • fDate
    1/1/1997 12:00:00 AM
  • Firstpage
    180
  • Lastpage
    184
  • Abstract
    This paper presents a novel AC/DC noise measurement system. This system simultaneously uses a high DC current to generate 1/f2 noise (electromigration noise) in thin films and a low AC current to detect that noise. This new system allows us to separate the noise components of metal thin films and is more stable and sensitive than its predecessors
  • Keywords
    1/f noise; bridge instruments; electric noise measurement; electromigration; integrated circuit measurement; integrated circuit metallisation; integrated circuit testing; metallic thin films; 1/f2 noise; AC/DC wafer-level noise measurement system; electromigration noise measurements; high DC current; low AC current; metal thin films; Background noise; Battery charge measurement; Circuit noise; Current measurement; Electrical resistance measurement; Electromigration; Noise generators; Noise measurement; Power measurement; Semiconductor device noise;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.554808
  • Filename
    554808
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1295459