Simple method of fabricating polarisation-insensitive and very low crosstalk AWG grating devices

Author

Ojha, S.M. ; Cureton, C. ; Bricheno, T. ; Day, S. ; Moule, D. ; Bell, A.J. ; Taylor, J.

Author_Institution

Nortel plc, Harlow, UK

Volume

34

Issue

1

fYear

1998

fDate

1/8/1998 12:00:00 AM

Firstpage

78

Lastpage

79

Abstract

A simple method of fabricating polarisation insensitive and very low crosstalk dense-WDM devices has been developed. The matching of the thermal coefficient of expansion (TCE) of the overcladding layer to the silicon substrate, for a 16 channel arrayed-waveguide demultiplexer, resulted in very low polarisation sensitivity (0.03 nm). The TCE of the undercladding and the core layers, on the other hand, were found to have negligible effect on the polarisation sensitivity. PECVD was used for depositing all the oxide layers

Keywords

chemical vapour deposition; demultiplexing equipment; diffraction gratings; integrated optics; light polarisation; optical communication equipment; optical crosstalk; optical fabrication; optical waveguide components; wavelength division multiplexing; 16 channel demultiplexer; AWG grating devices; PECVD; Si; Si substrate; TCE matching; arrayed-waveguide demultiplexer; arrayed-waveguide grating; dense-WDM devices; fabrication method; overcladding layer; oxide layers; polarisation sensitivity; polarisation-insensitive device; thermal coefficient of expansion; very low crosstalk;

fLanguage

English

Journal_Title

Electronics Letters

Publisher

iet

ISSN

0013-5194

Type

jour

DOI

10.1049/el:19980079

Filename

654533