DocumentCode
1301957
Title
Modeling and Experimental Verification of Misalignment Tolerance in Inductive-Coupling Inter-Chip Link for Low-Power 3-D System Integration
Author
Niitsu, Kiichi ; Kohama, Yoshinori ; Sugimori, Yasufumi ; Kasuga, Kazutaka ; Osada, Kenichi ; Irie, Naohiko ; Ishikuro, Hiroki ; Kuroda, Tadahiro
Author_Institution
Dept. of Electron. & Electr. Eng., Keio Univ., Yokohama, Japan
Volume
18
Issue
8
fYear
2010
Firstpage
1238
Lastpage
1243
Abstract
Modeling and experimental verification of misalignment tolerance in inductive-coupling inter-chip links for 3-D system integration is introduced for the first time. Misalignment between stacked chips reduces coupling coefficiency of on-chip inductors and increases transmitter power. We proposed a modeling which estimates the increase in transmitter power by considering misalignment as an additional communication distance. Proposed model was verified by electromagnetic simulations and by measurements using testchips fabricated in 65-nm CMOS technology. The results calculated by the proposed modeling match well with measurement results. Measurement results show that misalignment tolerance of inductive-coupling link is well high and can be ignored in common conditions.
Keywords
CMOS integrated circuits; low-power electronics; three-dimensional integrated circuits; CMOS technology; coupling coefficiency; electromagnetic simulation; inductive-coupling interchip link; low-power 3D system integration; misalignment tolerance; on-chip inductor; size 65 nm; High-speed interconnect; SiP; low-power design; misalignment; wireless interconnect;
fLanguage
English
Journal_Title
Very Large Scale Integration (VLSI) Systems, IEEE Transactions on
Publisher
ieee
ISSN
1063-8210
Type
jour
DOI
10.1109/TVLSI.2009.2020724
Filename
5208378
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