• DocumentCode
    1306438
  • Title

    Verification of saturation velocity lowering in MOSFET´s inversion layer

  • Author

    Shigyo, Naoyuki ; Shimane, Takeshi ; Suda, Motomu ; Enda, Toshiyuki ; Fukuda, Sanae

  • Author_Institution
    Microelectron. Eng. Lab., Toshiba Corp., Yokohama, Japan
  • Volume
    45
  • Issue
    2
  • fYear
    1998
  • fDate
    2/1/1998 12:00:00 AM
  • Firstpage
    460
  • Lastpage
    464
  • Abstract
    With reduction of the MOSFET´s channel length L, the drain saturation current of MOSFET´s is determined by the saturation velocity vsat in the inversion layer. Hence, the modeling of vsat becomes very important. In this paper, vsat in the inversion layer has been examined by using simulation experiment. New parameter values for vsat model in the inversion layer are proposed. In order to verify the vsat model, the impurity profiles of MOSFET´s are calibrated to fit the threshold voltage Vth-L characteristics. Then, we validate new vsat model by comparing the experiments of ID-VD characteristics of 0.35-μm CMOS with the simulations using the energy transport model (ETM)
  • Keywords
    MOSFET; electric fields; impurity distribution; inversion layers; semiconductor device models; 0.35 micron; ID-VD characteristics; MOSFET; channel length; drain saturation current; energy transport model; impurity profiles; inversion layer; modeling; saturation velocity lowering; simulation experiment; threshold voltage; vsat model; Capacitance; Electron mobility; Helium; Impurities; MOSFET circuits; Nonuniform electric fields; Optical scattering; Phonons; Semiconductor device modeling; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.658681
  • Filename
    658681