DocumentCode
1306438
Title
Verification of saturation velocity lowering in MOSFET´s inversion layer
Author
Shigyo, Naoyuki ; Shimane, Takeshi ; Suda, Motomu ; Enda, Toshiyuki ; Fukuda, Sanae
Author_Institution
Microelectron. Eng. Lab., Toshiba Corp., Yokohama, Japan
Volume
45
Issue
2
fYear
1998
fDate
2/1/1998 12:00:00 AM
Firstpage
460
Lastpage
464
Abstract
With reduction of the MOSFET´s channel length L, the drain saturation current of MOSFET´s is determined by the saturation velocity vsat in the inversion layer. Hence, the modeling of vsat becomes very important. In this paper, vsat in the inversion layer has been examined by using simulation experiment. New parameter values for vsat model in the inversion layer are proposed. In order to verify the vsat model, the impurity profiles of MOSFET´s are calibrated to fit the threshold voltage Vth-L characteristics. Then, we validate new vsat model by comparing the experiments of ID-VD characteristics of 0.35-μm CMOS with the simulations using the energy transport model (ETM)
Keywords
MOSFET; electric fields; impurity distribution; inversion layers; semiconductor device models; 0.35 micron; ID-VD characteristics; MOSFET; channel length; drain saturation current; energy transport model; impurity profiles; inversion layer; modeling; saturation velocity lowering; simulation experiment; threshold voltage; vsat model; Capacitance; Electron mobility; Helium; Impurities; MOSFET circuits; Nonuniform electric fields; Optical scattering; Phonons; Semiconductor device modeling; Threshold voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.658681
Filename
658681
Link To Document