DocumentCode
1307067
Title
Radial yield variations in semiconductor wafers
Author
Ferris-Prabhu, Albert V. ; Smith, Larry D. ; Bonges, Henry A. ; Paulsen, James K.
Author_Institution
IBM, Essex Junction, VT, USA
Volume
3
Issue
2
fYear
1987
fDate
3/1/1987 12:00:00 AM
Firstpage
42
Lastpage
47
Abstract
Detailed examination of yield data from several different products in two different technologies and two different wafer sizes has shown a pronounced radial dependence. In all cases, the yield profile has a distinct knee starting at about 10 mm from the wafer periphery, dropping steeply within the final 5 mm. The similarity in yield profile near the periphery across all the products examined suggests that edge yield loss is of a gross nature and is not caused by design, technology, wafer size, or random defects.
fLanguage
English
Journal_Title
Circuits and Devices Magazine, IEEE
Publisher
ieee
ISSN
8755-3996
Type
jour
DOI
10.1109/MCD.1987.6323237
Filename
6323237
Link To Document