• DocumentCode
    1307786
  • Title

    Neutron radiation tolerance of advanced UHV/CVD SiGe HBT BiCMOS technology

  • Author

    Roldán, Juan M. ; Ansley, William E. ; Cressler, John D. ; Clark, Steven D. ; Nguyen-Ngoc, Dominique

  • Author_Institution
    Alabama Microelectron. Sci. & Technol. Center, Auburn Univ., AL, USA
  • Volume
    44
  • Issue
    6
  • fYear
    1997
  • fDate
    12/1/1997 12:00:00 AM
  • Firstpage
    1965
  • Lastpage
    1973
  • Abstract
    The effects of 1.0 MeV neutron irradiation on both SiGe heterojunction bipolar transistors (HBTs) and Si CMOS transistors from an advanced ultra high vacuum chemical vapour deposition (UHV/CVD) SiGe BiCMOS technology are examined for the first time over the temperature range of 300 K to 84 K. Results at 300 K indicate that this SiGe technology is robust with respect to neutron radiation. At fluences as high as 1015 n/cm2 (1.0 MeV equivalent) the devices exhibited a degradation of less than 30% in peak current gain. The SiGe HBTs maintain a current gain of 60 after 1015 n/cm 2 at 84 K, compared to the Si BJT which degrades with cooling to a current gain of 20 at 84 K. The cutoff frequencies of both the Si and SiGe transistors are unaffected by neutron irradiation, and only a slight degradation in the maximum oscillation frequency of the transistors was observed
  • Keywords
    BiCMOS integrated circuits; Ge-Si alloys; MOSFET; heterojunction bipolar transistors; neutron effects; semiconductor materials; 1 MeV; 84 to 300 K; Si; Si CMOS transistors; SiGe; SiGe HBT BiCMOS technology; SiGe heterojunction bipolar transistors; UHV/CVD technology; chemical vapour deposition; cooling; current gain; cutoff frequencies; maximum oscillation frequency; neutron irradiation; neutron radiation tolerance; ultra high vacuum; BiCMOS integrated circuits; CMOS technology; Chemical technology; Chemical vapor deposition; Cutoff frequency; Degradation; Germanium silicon alloys; Heterojunction bipolar transistors; Neutrons; Silicon germanium;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.658970
  • Filename
    658970