Surface-micromachined micro-XYZ stages for free-space microoptical bench

Author

Lin, Lih Y. ; Shen, J.L. ; Lee, S.S. ; Wu, M.C.

Author_Institution

Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA

Volume

9

Issue

3

fYear

1997

fDate

3/1/1997 12:00:00 AM

Firstpage

345

Lastpage

347

Abstract

Micro-XYZ stages have been monolithically integrated with microactuators and out-of-plane microoptical elements, all fabricated by the same surface-micromachined process, on Si free-space microoptical bench. Optical beam adjustment with three degrees of freedom has been realized without angular squinting. A positioning accuracy of 11 nm has been achieved by the integrated scratch drive actuators, with the travel distance larger than 30 μm in each direction.

Keywords

integrated optoelectronics; measurement errors; microactuators; micromachining; optical design techniques; optical fabrication; silicon; 30 mum; Si free-space microoptical bench; degrees of freedom; free-space microoptical bench; integrated scratch drive actuators; micro-XYZ stages; microactuators; monolithically integrated; optical beam adjustment; out-of-plane microoptical elements; positioning accuracy; surface-micromachined; surface-micromachined process; travel distance; Actuators; Beam steering; Integrated optics; Lenses; Microactuators; Mirrors; Optical beams; Optical device fabrication; Optical refraction; Optical sensors;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/68.556068

Filename

556068