• DocumentCode
    1315783
  • Title

    Passive electrical vernier for measuring mask misalignment

  • Author

    Walton, J. ; Fallon, M. ; Ward, D. ; Holwill, R.J.

  • Author_Institution
    Inst. of Acoust., Nanjing Univ., China
  • Volume
    26
  • Issue
    15
  • fYear
    1990
  • fDate
    7/19/1990 12:00:00 AM
  • Firstpage
    1173
  • Lastpage
    1174
  • Abstract
    A passive electrical vernier for the measurement of the misalignment between the layers of integrated circuits is presented. This three layer structure has the same simplicity of processing as analogue structures along with the advantages of digital measurement which make it an attractive alternative for measuring the mask misalignment between layers.
  • Keywords
    VLSI; displacement measurement; integrated circuit technology; masks; position measurement; digital measurement; layers of integrated circuits; mask misalignment between layers; measuring mask misalignment; passive electrical vernier; three layer structure;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19900759
  • Filename
    82929