• DocumentCode
    1326148
  • Title

    Pulsewidth and rising time of relativistic electron beam in gas-filled diode

  • Author

    Ko, J.J. ; Choi, E.H. ; Choi, M.C. ; Seo, Yoonho ; Cho, G.S. ; Shin, H.M. ; Uhm, H.S.

  • Author_Institution
    Dept. of Electrophys., Kwangwoon Univ., Seoul, South Korea
  • Volume
    25
  • Issue
    2
  • fYear
    1997
  • fDate
    4/1/1997 12:00:00 AM
  • Firstpage
    400
  • Lastpage
    404
  • Abstract
    The pulsewidth and rising time of a mildly relativistic electron beam (300 kV, 1-3 kA) passing through a gas-filled diode region are investigated experimentally under various gas pressures P. The pulsewidth and rising time of a relativistic electron beam (REB) were controlled by adjusting the gas pressures P of the diode region. The pulsewidth and rising time of the relativistic electron beam are experimentally found to scale as P-0.807±0.054 and P -0.770±0.058, respectively. The REB pulsewidth and rising time are shown to have the same scaling law, within the experimental error range as a function of pressure. In particular, the empirical scaling law of the REB pulsewidth is in remarkably good agreement with the numerical scaling law P-0.809±0.059 of the full-space charge neutralization time tn at which the ion density ni is just equal to the electron beam density n b at the diode region under a given gas pressure P. It also is found that ion density ni at the full space-charge neutralization time tn has quite a similar profile in terms of pressure P to that of the REB peak current detected by a Faraday cup
  • Keywords
    electron beams; gas-discharge tubes; plasma diodes; plasma-beam interactions; relativistic electron beam tubes; 1 to 3 kA; 300 kV; Faraday cup; full-space charge neutralization time; gas-filled diode; numerical scaling law; pulsewidth; relativistic electron beam; rising time; Capacitors; Diodes; Electron beams; Impedance; Laser beams; Pressure control; Pulse generation; Space vector pulse width modulation; Switches; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.602518
  • Filename
    602518