DocumentCode
1328381
Title
Use of UV to reduce particle trapping in process plasmas
Author
Rosenberg, M. ; Mendis, D.A.
Author_Institution
Dept. of Electr. & Comput. Eng., California Univ., San Diego, La Jolla, CA, USA
Volume
24
Issue
3
fYear
1996
fDate
6/1/1996 12:00:00 AM
Firstpage
1133
Lastpage
1136
Abstract
The use of ultraviolet (UV) radiation to reduce the negative charge on dust particles and modify force balance in particle traps in processing plasmas is investigated theoretically. Possible photophoresis associated with the UV flux is also discussed. The use of UV to facilitate moving contaminant particles from traps is considered
Keywords
particle traps; photophoresis; plasma impurities; plasma transport processes; radiation pressure; UV flux; dust particles; force balance; negative charge reduction; particle trapping; photophoresis; process plasmas; ultraviolet radiation; Drag; Dusty plasma; Electrons; Electrostatics; Plasma applications; Plasma density; Plasma devices; Plasma materials processing; Plasma sheaths; Radio frequency;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.533122
Filename
533122
Link To Document