• DocumentCode
    1328812
  • Title

    An Advancement in Transistor Second Breakdown Performance Using Molybdenum Metalization

  • Author

    Hakim, Edward B.

  • Author_Institution
    Semiconductor Devices Branch, U. S. Army Electronics Command, Fort Monmouth, N. J. 07703
  • Issue
    1
  • fYear
    1968
  • fDate
    3/1/1968 12:00:00 AM
  • Firstpage
    45
  • Lastpage
    50
  • Abstract
    Transistor second breakdown failures usually appear as collector-emitter short circuits. Microscopic examination of these devices shows that the contact metalization has undergone physical change. Cross sectioning shows that the short circuit is the result of the contact metal melting and alloying into the device. If it is assumed that second breakdown itself is not destructive but leads to the melting and alloying of the contact metalization, then a high temperature metal should be superior to aluminum for withstanding hot spots. This paper describes the experimental results of transistors having molybdenum-aluminum metalization compared to devices with only aluminum contacts. The results indicate that devices with molybdenum, when driven into second breakdown, will outlive aluminum units with respect to current by a factor of three.
  • Keywords
    Alloying; Aluminum; Breakdown voltage; Circuits; Electric breakdown; Gold; Inorganic materials; Silicon; Temperature; Transistors;
  • fLanguage
    English
  • Journal_Title
    Reliability, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9529
  • Type

    jour

  • DOI
    10.1109/TR.1968.5217505
  • Filename
    5217505