Rotational hysteresis model for stressed ferromagnetic films

Author

Callegaro, Luca ; Puppin, Ezio

Author_Institution

INFM-Dipt. di Fisica, Politecnico di Milano, Italy

Volume

33

Issue

2

fYear

1997

fDate

3/1/1997 12:00:00 AM

Firstpage

1007

Lastpage

1011

Abstract

The effect of an external mechanical stress on the coercive force of Ni is different for bulk and for thin films. The bulk behavior is correctly explained by the Sablik-Jiles model which assumes that wall displacement is the driving mechanism of the magnetization process. In thin films, on the other hand, magnetization rotation might be a relevant mechanism, and this could explain the experimental differences with respect to bulk. In order to verify the correctness of this assumption, we constructed another model which was based on magnetization rotation. This new model is based on the bidimensional Stoner-Wohlfarth model, with additional terms which account for magnetostrictive energy and interactions among grains. Its predictions about coercive force behavior and general cycle shape are compared with experimental data on electroplated and evaporated Ni films with thicknesses from 15 to 200 nm

Keywords

coercive force; ferromagnetic materials; magnetic anisotropy; magnetic hysteresis; magnetic thin films; magnetostriction; nickel; 15 to 200 nm; Ni; bidimensional Stoner-Wohlfarth model; coercive force; cycle shape; external mechanical stress; magnetization rotation; magnetostrictive energy; rotational hysteresis model; stressed ferromagnetic films; Anisotropic magnetoresistance; Coercive force; Magnetic anisotropy; Magnetic films; Magnetic hysteresis; Magnetization processes; Magnetostriction; Perpendicular magnetic anisotropy; Stress; Transistors;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.558520

Filename

558520