• DocumentCode
    1333715
  • Title

    Surface-Potential-Based Analytic DC I V Model With Effective Electron Density for

  • Author

    Park, Jun-Hyun ; Kim, Yongsik ; Kim, Sungchul ; Bae, Hagyoul ; Kim, Dae Hwan ; Kim, Dong Myong

  • Author_Institution
    Sch. of Electr. Eng., Kookmin Univ., Seoul, South Korea
  • Volume
    32
  • Issue
    11
  • fYear
    2011
  • Firstpage
    1540
  • Lastpage
    1542
  • Abstract
    A surface-potential-based analytic direct-current I -V model for amorphous indium-gallium-zinc-oxide thin-film transistors is proposed by adopting an effective electron density (neff) model for inclusion of both free carriers and localized charges in the channel. The proposed neff is efficient in reducing the error caused by neglecting the localized electron density nloc and allows a closed form of the analytic I-V model. The potential drop across the parasitic resistance RP in the source and drain regions is also fully considered in the model. Finally, we confirmed good agreement of the proposed model with measured IDS-VDS characteristics over a wide range of VGS and VDS.
  • Keywords
    amorphous semiconductors; electron density; gallium compounds; indium compounds; semiconductor device models; surface potential; thin film transistors; zinc compounds; IDS-VDS characteristics; InGaZnO; a-IGZO TFT; amorphous indium-gallium-zinc-oxide; analytic direct-current I -V model; effective electron density; free carriers; localized charges; localized electron density; parasitic resistance; surface potential; thin-film transistors; Analytical models; Electric potential; Integrated circuit modeling; Surface resistance; Thin film transistors; $I$ $V$ model; Amorphous; analytic model; effective density; indium–gallium–zinc–oxide (IGZO); parasitic resistance; thin-film transistor (TFT);
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2011.2163810
  • Filename
    6029283