DocumentCode
1333785
Title
Sb-rich Si–Sb–Te Phase-Change Material for Phase-Change Random Access Memory Applications
Author
Wu, Liangcai ; Zhou, Xilin ; Song, Zhitang ; Zhu, Min ; Cheng, Yan ; Rao, Feng ; Song, Sannian ; Liu, Bo ; Feng, Songlin
Author_Institution
State Key Lab. of Functional Mater. for Inf., Shanghai Inst. of Microsyst. & Inf. Technol., Shanghai, China
Volume
58
Issue
12
fYear
2011
Firstpage
4423
Lastpage
4426
Abstract
An Sb-rich (48 at.%) Si-Sb-Te phase-change material with moderate Si content (24 at.%) is proposed for phase-change random access memory (PCRAM) applications. The real time amorphous to crystalline transformation was studied by in situ transmission electron microscopy observations and in situ resistance measurements. The results of time-dependent resistance measurements show that the Si24Sb48Te28 phase-change material has data retention of 10 years at about 382 K, suggesting a more stable amorphous state than the usual Ge2Sb2Te5 (GST) phase-change material. The reversible set-reset ability of the PCRAM cell based on the Si24Sb48Te28 phase-change material is much better than that of the device employing GST. The programming cycles can reach 2.2 × 104 under a set pulse of 1.5 V/1000 ns with a 30-ns falling edge and a reset pulse of 3.5 V/400 ns, whereas the resistance contrast retains a value of as large as two orders of magnitude.
Keywords
antimony alloys; phase change materials; phase change memories; silicon alloys; tellurium alloys; transmission electron microscopy; (PCRAM) applications; Phase-Change Material; Phase-Change Random Access Memory Applications; Si24Sb48Te28; data retention; real time amorphous to crystalline transformation; reversible set-reset ability; time 10 year; time 30 ns; time-dependent resistance measurements; transmission electron microscopy; Annealing; Crystallization; Phase change random access memory; Resistance; Silicon; Thermal stability; Nonvolatile memory; Sb-rich Si-Sb-Te; phase-change material; phase-change random access memory (PCRAM);
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2011.2167152
Filename
6029293
Link To Document