• DocumentCode
    1334224
  • Title

    PZT transduction of high-overtone contour- mode resonators

  • Author

    Chandrahalim, Hengky ; Bhave, Sunil A. ; Polcawich, Ronald G. ; Pulskamp, Jeffrey S. ; Kaul, Roger

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Cornell Univ., Ithaca, NY, USA
  • Volume
    57
  • Issue
    9
  • fYear
    2010
  • fDate
    9/1/2010 12:00:00 AM
  • Firstpage
    2035
  • Lastpage
    2041
  • Abstract
    This paper presents the Butterworth-van Dyke model and quantitative comparison that explore the design space of lead zirconate titanate-only (PZT) and PZT on 3-, 5-, and 10-μm single-crystal silicon (SCS) high-overtone widthextensional mode (WEM) resonators with identical lateral dimensions for incorporation into radio frequency microelectromechanical systems (RF MEMS) filters and oscillators. A novel fabrication technique was developed to fabricate the resonators with and without a silicon carrier layer using the same mask set on the same wafer. The air-bridge metal routings were implemented to carry electrical signals while avoiding large capacitances from the bond-pads. We theoretically derived and experimentally measured the correlation of motional impedance (RX), quality factor (Q), and resonance frequency (f) with the resonators´ silicon layer thickness (tSi) up to frequencies of operation above 1 GHz.
  • Keywords
    lead compounds; micromechanical resonators; radiofrequency oscillators; resonator filters; Butterworth-van Dyke model; PZT; PZT transduction; RF MEMS; Si; air-bridge metal routings; bond-pads; contour-mode resonators; design space; electrical signals; filters; high-overtone width extensional mode resonators; lateral dimensions; lead zirconate titanate; mask set; motional impedance; oscillators; quality factor; radiofrequency microelectromechanical systems; resonance frequency; resonator silicon layer thickness; silicon carrier layer; single-crystal silicon; size 10 mum; size 3 mum; size 5 mum; Capacitance; Electrodes; Fabrication; Force; Resonant frequency; Silicon; Stress;
  • fLanguage
    English
  • Journal_Title
    Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0885-3010
  • Type

    jour

  • DOI
    10.1109/TUFFC.2010.1651
  • Filename
    5585485