• DocumentCode
    1336497
  • Title

    Radiation-Hard Dielectrics for 4H–SiC: A Comparison Between \\hbox {SiO}_{2} and  \\hbox {Al}_{2}\\</h1></div></div>
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            <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Author</span></div><div class='col-12 col-md-9 leftDirection leftAlign'><h2 class='mb-0 fw-semibold'>Usman, Muhammad ; Hallén, Anders</h2></div></div>
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            <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Author_Institution</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>ICT, KTH R. Inst. of Technol., Kista, Sweden</div></div>
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            <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Volume</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>32</div></div>
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            <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Issue</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>12</div></div>
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            <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>fYear</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>2011</div></div>
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            <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Firstpage</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>1653</div></div>
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            <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Lastpage</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>1655</div></div>
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            <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Abstract</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>Ion implantation effects at SiO<sub>2</sub>/SiC and Al<sub>2</sub>O<sub>3</sub>/SiC interfaces have been investigated by implanting Ar ions at the interface of oxide and SiC. Capacitance-voltage relation and breakdown properties for these dielectrics are studied before and after implantation. The results indicate that the SiO<sub>2</sub>/SiC interface is sensitive to ion fluences higher than 1 × 10<sup>11</sup> cm<sup>-2</sup>, while Al<sub>2</sub>O<sub>3</sub> on SiC can sustain higher fluences. In addition, the breakdown of the Al<sub>2</sub>O<sub>3</sub> is found to be less sensitive to the ion implantation.</div></div>
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            <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Keywords</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>alumina; argon; electric breakdown; ion implantation; silicon compounds; 4H-SiC; Al<sub>2</sub>O<sub>3</sub>-SiC; SiC; SiO<sub>2</sub>-SiC; capacitance-voltage relation; dielectric breakdown property; ion implantation effect; radiation-hard dielectrics; Aluminum oxide; Capacitance; Dielectrics; Ion radiation; Passivity; Scattering; Silicon; Silicon carbide; 4H–SiC; Device passivation; dielectrics; elastic scattering; ion radiation effects; metal–oxide–semiconductor (MOS) interface;</div></div>
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            <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>fLanguage</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>English</div></div>
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            <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Journal_Title</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>Electron Device Letters, IEEE</div></div>
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            <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Publisher</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>ieee</div></div>
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            <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>ISSN</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>0741-3106</div></div>
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            <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>DOI</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>10.1109/LED.2011.2166992</div></div>
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            <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Filename</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>6031899</div></div>
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            <div class='row g-0 align-items-center'><div class='col-12 col-md-3 fw-bold mb-2 mb-md-0'><span class='text-muted small'>Link To Document</span></div><div class='col-12 col-md-9 leftDirection leftAlign'><a class='text-break' href='https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1336497' target='_blank' rel=https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1336497