DocumentCode
1336597
Title
A remote exposure reactor (RER) for plasma processing and sterilization by plasma active species at one atmosphere
Author
Roth, J. Reece ; Sherman, Daniel M. ; Gadri, Rami Ben ; Karakaya, Fuat ; Chen, ZhiYu ; Montie, Thomas C. ; Kelly-Wintenberg, Kimberly ; Tsai, Peter P Y
Author_Institution
Dept. of Electr. Eng., Tennessee Univ., Knoxville, TN, USA
Volume
28
Issue
1
fYear
2000
fDate
2/1/2000 12:00:00 AM
Firstpage
56
Lastpage
63
Abstract
We have developed a remote exposure reactor (RER) in which the active species of air and other gases responsible for sterilization and processing effects are generated on flat panels in a surface layer of one atmosphere uniform glow discharge plasma (OAUGDP). These active species are convected by forced airflow at one atmosphere and near room temperature to a remote exposure chamber in which the workpiece is located. This allows workpieces of any size or shape to be sterilized or processed without direct contact with the plasma. Here, we report operation of the RER as a sterilizer with both single-pass and recirculating active species flow through the remote exposure chamber. We used the RER to reduce the numbers of two genera of microorganisms (Esherichia coli and Staphylococcus aureus) on test samples of polypropylene fabric. When the recirculating airflow configuration was employed, the population both of E. coli and S. aureas cells was reduced by at least five decades after only 25 s of exposure. Tests in the single pass airflow configuration produced similar results, with the E. coli and S. aureas populations decreased by at least four decades after 25 s of exposure
Keywords
biological techniques; discharges (electric); microorganisms; plasma materials processing; plasma temperature; plasma-wall interactions; Esherichia coli; Staphylococcus aureus; convection; exposure; flat panels; forced airflow; genera; microorganisms; one atmosphere uniform glow discharge plasma; plasma active species; plasma processing; plasma sterilization; polypropylene fabric; population decrease; processing effects; recirculating active species flow; remote exposure reactor; single-pass active species flow; surface layer; workpiece shape; workpiece size; Atmosphere; Gases; Glow discharges; Inductors; Microorganisms; Plasma materials processing; Plasma temperature; Shape; Surface discharges; Testing;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.842864
Filename
842864
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