DocumentCode
1337285
Title
Hydrogen-Sensing Characteristics of a Pd/GaN Schottky Diode With a Simple Surface Roughness Approach
Author
Chen, Tai-You ; Chen, Huey-Ing ; Huang, Chien-Chang ; Hsu, Chi-Shiang ; Chiu, Po-Shun ; Chou, Po-Cheng ; Liu, Rong-Chau ; Liu, Wen-Chau
Author_Institution
Dept. of Electr. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
Volume
58
Issue
11
fYear
2011
Firstpage
4079
Lastpage
4086
Abstract
Hydrogen-sensing characteristics of a Pd/GaN Schottky diode with a simple surface roughness approach are studied and demonstrated. A high sensing response Sr of 2.05 × 105 and a large Schottky barrier height variation ratio (ΔφB/φair) of 36.3% upon exposure to a 1% H2/air gas at 303 K are found. They could be attributed to the presence of more adsorption sites caused by the employed surface plasma treatment. The increase in series resistance due to the decrease in sensing response under the applied voltage range from 0.5 to 1 V is found. Based on the kinetic analysis and transient-state behavior measurement, at 523 K, the studied device shows a faster adsorption time of 2.9 s and a higher initial rate of 968 μA/s. Consequently, the studied structure provides a promise for high-performance GaN-based Schottky-diode-type hydrogen sensor applications.
Keywords
Schottky diodes; gallium compounds; palladium; surface roughness; Pd-GaN; Schottky barrier height variation ratio; Schottky diode; adsorption sites; hydrogen-sensing characteristics; kinetic analysis; series resistance; surface plasma treatment; surface roughness approach; temperature 523 K; time 2.9 s; transient-state behavior measurement; voltage 0.5 V to 1 V; Gallium nitride; Gases; Rough surfaces; Schottky barriers; Sensors; Surface roughness; Surface treatment; GaN; Pd; Schottky diode; plasma treatment; surface roughness;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2011.2166269
Filename
6032084
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