• DocumentCode
    1341437
  • Title

    Surface Reactions and Defect Formation in Irradiated Graphene Devices

  • Author

    Puzyrev, Y.S. ; Wang, Bin ; Zhang, E.X. ; Zhang, C.X. ; Newaz, A.K.M. ; Bolotin, K.I. ; Fleetwood, D.M. ; Schrimpf, R.D. ; Pantelides, S.T.

  • Author_Institution
    Dept. of Phys. & Astron., Vanderbilt Univ., Nashville, TN, USA
  • Volume
    59
  • Issue
    6
  • fYear
    2012
  • Firstpage
    3039
  • Lastpage
    3044
  • Abstract
    Quantum mechanical-based kinetic Monte-Carlo calculations (KMC) are used to investigate mechanisms of degradation of graphene devices subjected to 10-keV x-ray irradiation, ozone exposure, and subsequent high-temperature annealing. Using KMC, we monitor the time evolution of defect concentrations on a graphene surface. The degradation mechanism for oxygen exposure and subsequent anneal of graphene surface greatly depends on the temperature and initial concentrations of H and O atoms on the graphene surface. At oxygen surface coverage of ~0.05 and higher, the damage is caused by formation of vacancies due to desorption of CO and CO2. Hydrogen facilitates the removal of O without introducing vacancies.
  • Keywords
    Monte Carlo methods; X-ray effects; annealing; carbon compounds; desorption; fullerene devices; graphene; nuclear electronics; surface chemistry; vacancies (crystal); C; CO; CO desorption; CO2; CO2 desorption; H atoms; O atoms; defect concentrations; defect formation; graphene devices degradation; graphene surface; high-temperature annealing; irradiated graphene devices; oxygen exposure; oxygen surface coverage; ozone exposure; quantum mechanical-based kinetic Monte-Carlo calculations; surface reactions; time evolution monitor; vacancies; x-ray irradiation; Degradation; Density functional theory; Graphene; Monte Carlo methods; Radiation effects; Defect formation; density functional theory (DFT); graphene; irradiation; kinetic Monte-Carlo (KMC);
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2012.2224134
  • Filename
    6365414