• DocumentCode
    1348659
  • Title

    Analyses on Small-Signal Parameters and Radio-Frequency Modeling of Gate-All-Around Tunneling Field-Effect Transistors

  • Author

    Cho, Seongjae ; Lee, Jae Sung ; Kim, Kyung Rok ; Park, Byung-Gook ; Harris, James S., Jr. ; Kang, In Man

  • Author_Institution
    Dept. of Electr. Eng., Stanford Univ., Stanford, CA, USA
  • Volume
    58
  • Issue
    12
  • fYear
    2011
  • Firstpage
    4164
  • Lastpage
    4171
  • Abstract
    The small-signal parameters of gate-all-around tunneling field-effect transistors (GAA TFETs) with different gate lengths were extracted and analyzed in terms of their gate capacitance, source-drain conductance, transconductance, distributed channel resistance, and inversion layer length. Because of the unique current drive and inversion layer formation mechanisms of a TFET compared to a conventional MOSFET, the gate-bias dependence values of the primary small-signal parameters of a GAA TFET also differ. Based on understanding these parameters, the high-frequency performances of GAA TFETs were investigated using a technology computer-aided design simulation. A nonquasistatic radio-frequency model was used to extract the small-signal parameters, which were verified up to 100 GHz. The modeling results showed excellent agreement with the Y-parameters up to the cutoff frequency fT.
  • Keywords
    field effect transistors; technology CAD (electronics); tunnelling; GAA TFET; Y-parameters; distributed channel resistance; gate capacitance; gate-all-around tunneling field-effect transistors; gate-bias dependence; inversion layer length; radiofrequency modeling; small-signal parameters; source-drain conductance; technology computer-aided design simulation; Capacitance; Integrated circuit modeling; Logic gates; MOSFET circuits; Radio frequency; Resistance; Transistors; Gate-all-around (GAA); modeling; nonquasi-static (NQS); radio-frequency (RF); small-signal parameters; technology computer-aided design (TCAD); tunneling field-effect transistor (TFET);
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2011.2167335
  • Filename
    6043869