• DocumentCode
    1349655
  • Title

    Plasma Immersion Ion Implantation Into Inner Surface of Cylindrical Bore Using Moving Auxiliary Electrode

  • Author

    Wang, Peng ; Tian, Xiubo ; Gong, Chunzhi ; Yang, Shiqin ; Chu, Paul K.

  • Author_Institution
    State Key Lab. of Adv. Welding Production & Technol., Harbin Inst. of Technol., Harbin, China
  • Volume
    39
  • Issue
    11
  • fYear
    2011
  • Firstpage
    3120
  • Lastpage
    3124
  • Abstract
    Plasma immersion ion implantation into inner surfaces of tubes has practical importance, but intrinsic drawbacks such as poor dose uniformity and small equivalent ion flux have limited wider applications. In this paper, a new technique utilizing a moving auxiliary electrode inside the tube to improve the dose uniformity and ion implantation efficiency is described. The effects of the moving auxiliary electrode are investigated by 2-D particle-in-cell simulation. The results show that, when the grounded auxiliary electrode is withdrawn along the axis of the tube, external ions are continuously attracted into the tube and implanted into the interior wall. It is verified by the incident dose peak when the auxiliary electrode is kept at a certain location inside the tube. Uniform ion implantation into a cylindrical bore can be accomplished by physical translation of the electrode, and this technique is suitable for implantation of long tubes without an internal plasma source.
  • Keywords
    electrodes; numerical analysis; plasma immersion ion implantation; plasma simulation; 2D particle-in-cell simulation; cylindrical bore; dose uniformity; equivalent ion flux; external ions; grounded auxiliary electrode; incident dose peak; interior wall; ion implantation efficiency; long tube implantation; moving auxiliary electrode; physical translation; plasma immersion ion implantation; tube axis; tube inner surface; uniform ion implantation; Educational institutions; Electrodes; Electron tubes; Ion implantation; Materials; Plasma sources; Moving auxiliary electrode; numerical simulation; particle-in-cell (PIC); plasma immersion ion implantation (PIII);
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2011.2162751
  • Filename
    6044725