• DocumentCode
    1350710
  • Title

    Equations of state for silicon inversion layers

  • Author

    Ancona, Mario G.

  • Author_Institution
    Naval Res. Lab., Washington, DC, USA
  • Volume
    47
  • Issue
    7
  • fYear
    2000
  • fDate
    7/1/2000 12:00:00 AM
  • Firstpage
    1449
  • Lastpage
    1456
  • Abstract
    The accuracy of a generalized diffusion-drift description known as density-gradient theory for modeling the quantized inversion layer on (100) Si is studied in detail by comparing its results with corresponding Schrodinger-Poisson calculations. A key element of density-gradient theory is the equation of state used to model the response of the electron gas. A variety of such equations are considered including new approaches for modeling the lifting of the conduction band valley degeneracy and for representing exchange-correlation effects. On the whole, the theory does remarkably well over a wide range of biases, oxide thicknesses, and doping concentrations. For shallow wells and for simulating the density deep inside the semiconductor density-gradient theory actually outperforms the quantum mechanical approach unless the latter includes large numbers of subbands. When comparing with experiment, neither theory works that well in a predictive sense because of uncertainties in the treatment of the oxide and of the gate
  • Keywords
    MIS devices; conduction bands; electron gas; elemental semiconductors; equations of state; inversion layers; silicon; (100) Si; MOS devices; Schrodinger-Poisson calculations; Si; Si inversion layers; conduction band valley degeneracy; density-gradient theory; electron gas response modelling; equation of state; exchange-correlation effects; generalized diffusion-drift description; quantized inversion layer; shallow wells; Charge carrier processes; Chemicals; Computational modeling; Electrons; Equations; MOS devices; Quantum mechanics; Semiconductor device doping; Semiconductor process modeling; Silicon;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.848290
  • Filename
    848290