DocumentCode
1354741
Title
Silicon planar ACCUFET: improved power MOSFET structure
Author
Bobde, M.D. ; Baliga, B.J.
Author_Institution
Power Semicond. Res. Center, North Carolina State Univ., Raleigh, NC, USA
Volume
36
Issue
10
fYear
2000
fDate
5/11/2000 12:00:00 AM
Firstpage
913
Lastpage
915
Abstract
An improved power MOSFET structure in silicon. Called the planar ACCUmulation channel field effect transistor (planar ACCUFET) is proposed. In this device, the P base and the deep P+ regions of the conventional DMOSFET are replaced by a depleted N-type base region created using a buried P+ region. Numerical simulations show that the planar ACCUFET has good forward blocking characteristics with low leakage current. The specific on-resistance, as well as the gate charge of the planar ACCUFET are lower than those of a DMOSFET with the same voltage rating. Furthermore, the planar ACCUFET requires a smaller thermal budget for fabrication than the DMOSFET
Keywords
elemental semiconductors; power MOSFET; silicon; Si; fabrication; forward blocking; gate charge; leakage current; numerical simulation; planar accumulation channel field effect transistor; power MOSFET; silicon planar ACCUFET; specific on-resistance; thermal budget;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20000647
Filename
850526
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