• DocumentCode
    1354741
  • Title

    Silicon planar ACCUFET: improved power MOSFET structure

  • Author

    Bobde, M.D. ; Baliga, B.J.

  • Author_Institution
    Power Semicond. Res. Center, North Carolina State Univ., Raleigh, NC, USA
  • Volume
    36
  • Issue
    10
  • fYear
    2000
  • fDate
    5/11/2000 12:00:00 AM
  • Firstpage
    913
  • Lastpage
    915
  • Abstract
    An improved power MOSFET structure in silicon. Called the planar ACCUmulation channel field effect transistor (planar ACCUFET) is proposed. In this device, the P base and the deep P+ regions of the conventional DMOSFET are replaced by a depleted N-type base region created using a buried P+ region. Numerical simulations show that the planar ACCUFET has good forward blocking characteristics with low leakage current. The specific on-resistance, as well as the gate charge of the planar ACCUFET are lower than those of a DMOSFET with the same voltage rating. Furthermore, the planar ACCUFET requires a smaller thermal budget for fabrication than the DMOSFET
  • Keywords
    elemental semiconductors; power MOSFET; silicon; Si; fabrication; forward blocking; gate charge; leakage current; numerical simulation; planar accumulation channel field effect transistor; power MOSFET; silicon planar ACCUFET; specific on-resistance; thermal budget;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20000647
  • Filename
    850526