Plasma-immersion ion implantation of the interior surface of a small cylindrical bore using an auxiliary electrode for finite rise-time voltage pulses

Author

Zeng, Xuchu ; Kwok, Tat-Kun ; Liu, Aiguo ; Chu, Paul K. ; Tang, Baoyin ; Sheridan, Terrence E.

Author_Institution

Dept. of Phys. & Mater. Sci., City Univ. of Hong Kong, Kowloon, Hong Kong

Volume

26

Issue

2

fYear

1998

fDate

4/1/1998 12:00:00 AM

Firstpage

175

Lastpage

180

Abstract

Plasma-immersion ion implantation (PIII) can be used to process the interior surfaces of odd-shape specimens such as a cylindrical bore. The temporal evolution of the plasma sheath in a small cylindrical bore in the presence of a grounded coaxial auxiliary electrode is derived for voltage pulses of different rise times by solving Poisson´s equation and the equations of ion continuity, and motion numerically using the appropriate boundary conditions. It is found that the maximum ion impact energy and the average impact energy are improved for finite rise-time voltage pulses, and shorter rise times yield better results. Our results allow the selection of a suitable auxiliary electrode radius to improve the average impact energy for a given rise time

Keywords

ion implantation; plasma applications; plasma sheaths; Poisson´s equation; auxiliary electrode; auxiliary electrode radius; average impact energy; boundary conditions; finite rise-time voltage pulses; grounded coaxial auxiliary electrode; interior surface; ion continuity; maximum ion impact energy; numerical method; odd-shape specimens; plasma sheath; plasma-immersion ion implantation; small cylindrical bore; voltage pulses; Boring; Boundary conditions; Coaxial components; Differential equations; Electrodes; Ion implantation; Plasma immersion ion implantation; Plasma sheaths; Poisson equations; Voltage;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.669623

Filename

669623