DocumentCode
1386919
Title
High coercivity SmFeSiC films fabricated by multilayer sputtering
Author
Zhang, S.Y. ; Shan, Z.S. ; Liu, Y. ; Sellmyer, D.J. ; Zhao, T.Y. ; Zhao, J.G. ; Shen, B.G.
Author_Institution
Center for Mater. Res. & Anal., Nebraska Univ., Lincoln, NE, USA
Volume
32
Issue
5
fYear
1996
fDate
9/1/1996 12:00:00 AM
Firstpage
4550
Lastpage
4552
Abstract
SmFeSiC thin films have been obtained by sputtering SmFe/C(Si) multilayers with a Ta underlayer on Si substrates and subsequently annealing at 700°C. The coercivity of the SmFeSiC films strongly depends on the sputtering and annealing conditions. The influence of the thickness of the Ta underlayer, the thickness ratio of SmFe to C(Si), the argon pressure and heat treatment were studied. In-plane coercivities up to 7.2 kOe and squareness of 0.94 were obtained
Keywords
annealing; coercive force; iron alloys; magnetic thin films; permanent magnets; samarium alloys; silicon alloys; sputter deposition; 700 degC; Si; Si substrates; SmFeSiC; Ta underlayer thickness; annealing; coercivity; multilayer sputtering; permanent magnet films; thin films; Annealing; Argon; Coercive force; Magnetic films; Nonhomogeneous media; Saturation magnetization; Semiconductor films; Sputtering; Temperature; X-ray diffraction;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.539077
Filename
539077
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