Perpendicular Co-Cr magnetic recording media prepared by sputtering using ECR microwave plasma

Author

Yamamoto, Setsuo ; Sato, Kimitaka ; Kurisu, Hiroki ; Matsuura, Mitsuru ; Hirono, Shigeru ; Maeda, Yasushi

Author_Institution

Fac. of Eng., Yamaguchi Univ., Ube, Japan

Volume

32

Issue

5

fYear

1996

fDate

9/1/1996 12:00:00 AM

Firstpage

3825

Lastpage

3827

Abstract

Perpendicular Co-Cr media were deposited on polyimide substrates by sputtering using an electron-cyclotron-resonance microwave plasma in an Ar sputtering gas pressure ranging from 3×10^-2 to 8×10^-2 Pa at a target to substrate distance from 170 to 230 mm. The accelerating voltage of the ions which bombard the media surface during deposition drastically affects the crystallographic and magnetic properties of Co-Cr films. Co-Cr media (50 nm in thickness) with good preferred crystal orientation (Δθ₅₀ less than 5 degrees), high perpendicular magnetic anisotropy (H_k higher than 4 kOe), high perpendicular coercivity (H_c⊥ over 1400 Oe) and no initial layer were successfully deposited when the ion accelerating voltage was reduced less than about 20 V

Keywords

chromium alloys; cobalt compounds; coercive force; magnetic thin films; perpendicular magnetic anisotropy; perpendicular magnetic recording; sputtered coatings; 20 V; 3E-2 to 8E-2 Pa; Co-Cr; Co-Cr film; ECR microwave plasma; anisotropy; coercivity; crystallographic properties; magnetic properties; perpendicular magnetic recording media; polyimide substrate; preferred crystal orientation; sputtering; Acceleration; Argon; Crystallography; Magnetic films; Magnetic properties; Magnetic recording; Plasma accelerators; Polyimides; Sputtering; Voltage;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.539185

Filename

539185