• DocumentCode
    1394738
  • Title

    Radiation effects in advanced microelectronics technologies

  • Author

    Johnston, A.H.

  • Author_Institution
    Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
  • Volume
    45
  • Issue
    3
  • fYear
    1998
  • fDate
    6/1/1998 12:00:00 AM
  • Firstpage
    1339
  • Lastpage
    1354
  • Abstract
    The pace of device scaling has increased rapidly in recent years. Experimental CMOS devices have been produced with feature sizes below 0.1 μm, demonstrating that devices with feature sizes between 0.1 and 0.25 μm will likely be available in mainstream technologies after the year 2000. This paper discusses how the anticipated changes in device dimensions and design are likely to affect their radiation response in space environments. Traditional problems, such as total dose effects, SEU and latchup are discussed, along with new phenomena. The latter include hard errors from heavy ions (microdose and gate-rupture errors), and complex failure modes related to advanced circuit architecture. The main focus of the paper is on commercial devices, which are displacing hardened device technologies in many space applications. However, the impact of device scaling on hardened devices is also discussed
  • Keywords
    CMOS integrated circuits; integrated circuit technology; radiation effects; radiation hardening (electronics); CMOS device scaling; SEU; design; failure mode; gate rupture errors; hard errors; hardened device; heavy ions; latchup; microdose errors; microelectronics technology; radiation response; space environment; total dose effect; CMOS technology; Integrated circuit technology; Laboratories; Microelectronics; Paper technology; Power supplies; Propulsion; Radiation effects; Space technology; Voltage;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.685206
  • Filename
    685206