DocumentCode
1394738
Title
Radiation effects in advanced microelectronics technologies
Author
Johnston, A.H.
Author_Institution
Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
Volume
45
Issue
3
fYear
1998
fDate
6/1/1998 12:00:00 AM
Firstpage
1339
Lastpage
1354
Abstract
The pace of device scaling has increased rapidly in recent years. Experimental CMOS devices have been produced with feature sizes below 0.1 μm, demonstrating that devices with feature sizes between 0.1 and 0.25 μm will likely be available in mainstream technologies after the year 2000. This paper discusses how the anticipated changes in device dimensions and design are likely to affect their radiation response in space environments. Traditional problems, such as total dose effects, SEU and latchup are discussed, along with new phenomena. The latter include hard errors from heavy ions (microdose and gate-rupture errors), and complex failure modes related to advanced circuit architecture. The main focus of the paper is on commercial devices, which are displacing hardened device technologies in many space applications. However, the impact of device scaling on hardened devices is also discussed
Keywords
CMOS integrated circuits; integrated circuit technology; radiation effects; radiation hardening (electronics); CMOS device scaling; SEU; design; failure mode; gate rupture errors; hard errors; hardened device; heavy ions; latchup; microdose errors; microelectronics technology; radiation response; space environment; total dose effect; CMOS technology; Integrated circuit technology; Laboratories; Microelectronics; Paper technology; Power supplies; Propulsion; Radiation effects; Space technology; Voltage;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/23.685206
Filename
685206
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