• DocumentCode
    1395584
  • Title

    Radiation dose measurment using MOSFETs

  • Author

    Sarrabayrouse, G. ; Siskos, S.

  • Author_Institution
    LAAS du CNRS, Toulouse, France
  • Volume
    1
  • Issue
    2
  • fYear
    1998
  • fDate
    6/1/1998 12:00:00 AM
  • Firstpage
    26
  • Lastpage
    34
  • Abstract
    The MOS transistor as a radiation dose detector has been presented. MOS transistors present advantages such as low cost, small volume and weight, robustness, accuracy, large measurable dose range, and sensitivity to low-energy radiation (10 keV). They are useful in real-time measurements or post-irradiation read-out, while they retain information after reading. The sensitivity of unbiased MOSFETs has been improved, and further improvement is possible by increasing the oxide thickness via dual dielectrics or by using ion-implanted oxides and stacked MOSFET configurations. The stacked-transistor configuration is a very promising solution to reach the mRad range (personnel dosimetry). MOSFETs are already used in various application fields with increasing interest for use in specific cases of in-vivo dosimetry
  • Keywords
    MOSFET; dosimeters; real-time systems; semiconductor counters; 10 keV; MOSFET; bias; dual dielectrics; in-vivo dosimetry; intracavitary dosimetry; ion-implanted oxides; mRad range; medical applications; military applications; nuclear poser plants; oxide thickness; personnel dosimetry; post-irradiation read-out; radiation dose measurements; real-time measurement; sensitivity; space applications; stacked MOSFET configurations; stacked-transistor configuration; Cathodes; Dielectrics and electrical insulation; Energy measurement; Interface states; Linearity; MOSFETs; Silicon; Spontaneous emission; Thickness measurement; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Instrumentation & Measurement Magazine, IEEE
  • Publisher
    ieee
  • ISSN
    1094-6969
  • Type

    jour

  • DOI
    10.1109/5289.685494
  • Filename
    685494