DocumentCode
1395584
Title
Radiation dose measurment using MOSFETs
Author
Sarrabayrouse, G. ; Siskos, S.
Author_Institution
LAAS du CNRS, Toulouse, France
Volume
1
Issue
2
fYear
1998
fDate
6/1/1998 12:00:00 AM
Firstpage
26
Lastpage
34
Abstract
The MOS transistor as a radiation dose detector has been presented. MOS transistors present advantages such as low cost, small volume and weight, robustness, accuracy, large measurable dose range, and sensitivity to low-energy radiation (10 keV). They are useful in real-time measurements or post-irradiation read-out, while they retain information after reading. The sensitivity of unbiased MOSFETs has been improved, and further improvement is possible by increasing the oxide thickness via dual dielectrics or by using ion-implanted oxides and stacked MOSFET configurations. The stacked-transistor configuration is a very promising solution to reach the mRad range (personnel dosimetry). MOSFETs are already used in various application fields with increasing interest for use in specific cases of in-vivo dosimetry
Keywords
MOSFET; dosimeters; real-time systems; semiconductor counters; 10 keV; MOSFET; bias; dual dielectrics; in-vivo dosimetry; intracavitary dosimetry; ion-implanted oxides; mRad range; medical applications; military applications; nuclear poser plants; oxide thickness; personnel dosimetry; post-irradiation read-out; radiation dose measurements; real-time measurement; sensitivity; space applications; stacked MOSFET configurations; stacked-transistor configuration; Cathodes; Dielectrics and electrical insulation; Energy measurement; Interface states; Linearity; MOSFETs; Silicon; Spontaneous emission; Thickness measurement; Threshold voltage;
fLanguage
English
Journal_Title
Instrumentation & Measurement Magazine, IEEE
Publisher
ieee
ISSN
1094-6969
Type
jour
DOI
10.1109/5289.685494
Filename
685494
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