• DocumentCode
    1400190
  • Title

    Experimental transient analysis of the tunnel current in EEPROM cells

  • Author

    Bez, Roberto ; Cantarelli, Daniele ; Cappelletti, Paolo

  • Author_Institution
    SGS-Thomson Microelectron., Milan, Italy
  • Volume
    37
  • Issue
    4
  • fYear
    1990
  • fDate
    4/1/1990 12:00:00 AM
  • Firstpage
    1081
  • Lastpage
    1086
  • Abstract
    Since the cell is written with a ramp waveform pulse in order to minimize the maximum tunnel current in actual device operation, the measurements were performed with ramp waveform writing pulses at different ramp speeds. The kind of information obtained from the transient analysis greatly improves the understanding of the device physics. By measuring tunnel current, some expected results, such as the dependence of the maximum current value on the ramp speed, were observed. Some unexpected results, such as an anomalous peak during the erasing operation and the influence of the ramp speed on the conduction properties of the thin oxide, which is shown by the Fowler-Nordheim plot of the experimental tunnel current, were also observed
  • Keywords
    EPROM; transients; tunnelling; EEPROM cells; Fowler-Nordheim plot; conduction properties; erasing operation; maximum current; ramp speeds; ramp waveform writing pulses; thin oxide; transient analysis; tunnel current; Capacitance; Character generation; EPROM; Electrons; Equations; Equivalent circuits; MOSFETs; Nonvolatile memory; Transient analysis; Writing;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.52445
  • Filename
    52445