• DocumentCode
    1401879
  • Title

    Generalized gradual channel modeling of field-effect transistors

  • Author

    Darling, Robert B.

  • Author_Institution
    Dept. of Electr. Eng., Washington Univ., Seattle, WA, USA
  • Volume
    35
  • Issue
    12
  • fYear
    1988
  • fDate
    12/1/1988 12:00:00 AM
  • Firstpage
    2302
  • Lastpage
    2314
  • Abstract
    The flow of current in the channel of the field-effect transistor (FET) is abstracted into a generalized curvilinear coordinate system that allows the transverse and longitudinal processes to be separated. By integrating over the conducting cross section of the channel, a set of generalized channel equations is derived that formally one-dimensionalizes the analysis of a FET for a Boltzmann balance equation transport model. Two mode approximations on the curvature of the channel and the uniformity of the velocity distribution across the channel allow the system of channel equations to be reduced to an extension of the gradual channel approximation of Schockley. The applicability of the formulation is demonstrated through the modeling of a GaAs metal-semiconductor FET (MESFET) that includes all of the Boltzmann equation terms for high-field electron transport as well as a small gate-length-to-channel-thickness ratio. The results indicate that gradual channel models, with suitable geometric modifications, can be used to study FETs using higher internal fields and smaller gate/channel dimensions than previously thought
  • Keywords
    III-V semiconductors; field effect transistors; gallium arsenide; semiconductor device models; 1D model; Boltzmann balance equation transport model; Boltzmann equation; FET; GaAs transistors; MESFET; channel current; channel curvature; conducting cross section; field-effect transistors; generalized channel equations; generalized curvilinear coordinate system; geometric modifications; gradual channel approximation of Schockley; gradual channel modeling; gradual channel models; high fields; high-field electron transport; integration over cross-section; longitudinal processes; metal-semiconductor FET; semiconductors; small dimensions; small gate-length-to-channel-thickness ratio; system of channel equations; transverse processes; two mode approximation; velocity distribution; Current density; Electrons; Equations; FETs; HEMTs; Kinetic energy; MESFETs; MODFETs; Temperature; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.8806
  • Filename
    8806