DocumentCode
1413435
Title
Integration of Self-Assembled Redox Molecules in Flash Memory Devices
Author
Shaw, Jonathan ; Zhong, Yu-Wu ; Hughes, Kevin J. ; Hou, Tuo-Hung ; Raza, Hassan ; Rajwade, Shantanu ; Bellfy, Julie ; Engstrom, James R. ; Abruña, Héctor D. ; Kan, Edwin Chihchuan
Author_Institution
Sch. of Electr. & Comput. Eng., Cornell Univ., Ithaca, NY, USA
Volume
58
Issue
3
fYear
2011
fDate
3/1/2011 12:00:00 AM
Firstpage
826
Lastpage
834
Abstract
Self-assembled monolayers (SAMs) of either ferrocenecarboxylic acid or 5-(4-Carboxyphenyl)-10,15,20-triphenyl-porphyrin-Co(II) (CoP) with a high- dielectric were integrated into the Flash memory gate stack. The molecular reduction-oxidation (redox) states are used as charge storage nodes to reduce charging energy and memory window variations. Through the program/erase operations over tunneling barriers, the device structure also provides a unique capability to measure the redox energy without strong orbital hybridization of metal electrodes in direct contact. Asymmetric charge injection behavior was observed, which can be attributed to the Fermi-level pinning between the molecules and the high- dielectric. With increasing redox molecule density in the SAM, the memory window exhibits a saturation trend. Three programmable molecular orbital states, i.e., CoP0, CoP1-, and CoP2-, can be experimentally observed through a charge-based nonvolatile memory structure at room temperature. The electrostatics is determined by the alignment between the highest occupied or the lowest unoccupied molecular orbital (HOMO or LUMO, respectively) energy levels and the charge neutrality level of the surrounding dielectric. Engineering the HOMO-LUMO gap with different redox molecules can potentially realize a multibit memory cell with less variation.
Keywords
electrostatics; flash memories; oxidation; reduction (chemical); 5-(4-Carboxyphenyl)-10,15,20-triphenyl-porphyrin-Co(II); Fermi-level pinning; HOMO energy level; LUMO energy level; asymmetric charge injection; charge-based nonvolatile memory structure; either ferrocenecarboxylic acid; electrostatics; flash memory devices; highest occupied molecular orbital; lowest unoccupied molecular orbital; molecular reduction-oxidation states; self-assembled monolayers; self-assembled redox molecules; Coulomb blockade effect; high-$kappa$ dielectric; nonvolatile memory devices; reduction–oxidation (redox)-active molecules; self-assembled monolayer (SAM);
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2010.2097266
Filename
5676192
Link To Document