Fabrication of a fiber probe with a nanometric protrusion for near-field optical microscopy by a novel technique of three-dimensional nanophotolithography

Author

Matsumoto, Takuya ; Ohtsu, Motoichi

Author_Institution

Interdisciplinary Graduate Sh. of Sci. & Eng., Tokyo Inst. of Technol., Japan

Volume

14

Issue

10

fYear

1996

fDate

10/1/1996 12:00:00 AM

Firstpage

2224

Lastpage

2230

Abstract

A new technique based on photolithography has been developed to fabricate a fiber probe with a nanometric protruding tip for near field optical microscopy. As a first step, an optical fiber is sharpened by chemical etching and coated with metallic film. Next, it is coated with photoresist and its apex region is selectively exposed to an evanescent wave. Finally, the metallic film at the apex region is etched away. The foot diameter of the protrusion fabricated by this method is about 30 nm

Keywords

etching; fibre optic sensors; metallic thin films; nanotechnology; optical microscopy; photolithography; photoresists; 30 nm; apex region; chemical etching; evanescent wave; fiber probe fabrication; fibre optic sensor fabrication; foot diameter; metallic film coated; nanometric protruding tip; nanometric protrusion; near field optical microscopy; near-field optical microscopy; photolithography; photoresist; three-dimensional nanophotolithography; Chemicals; Etching; Lithography; Optical device fabrication; Optical fibers; Optical films; Optical microscopy; Optical surface waves; Probes; Resists;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/50.541211

Filename

541211