• DocumentCode
    1424651
  • Title

    Operational analysis of synchrotron-based X-ray lithography: comparison of 200 mm and 300 mm wafer flows

  • Author

    White, K.P. ; Trybula, W.J.

  • Author_Institution
    University of Virginia
  • Volume
    23
  • Issue
    4
  • fYear
    2000
  • fDate
    10/1/2000 12:00:00 AM
  • Firstpage
    237
  • Lastpage
    237
  • Keywords
    Discrete event simulation; Frequency estimation; Microelectronics; Performance analysis; Process design; Semiconductor device modeling; State estimation; Synchrotron radiation; Throughput; X-ray lithography;
  • fLanguage
    English
  • Journal_Title
    Electronics Packaging Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1521-334X
  • Type

    jour

  • DOI
    10.1109/TEPM.2000.895064
  • Filename
    895064
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1424651