Growth and characterization of diamond films on nondiamond substrates for electronic applications

Author

Zhu, Wei ; Stoner, Brian R. ; Williams, Brad E. ; Glass, Jeffrey T.

Author_Institution

Dept. of Mater. Sci. & Eng., North Carolina State Univ., Raleigh, NC, USA

Volume

79

Issue

5

fYear

1991

fDate

5/1/1991 12:00:00 AM

Firstpage

621

Lastpage

646

Abstract

Recent advances in the chemical vapor deposition (CVD) and characterization of diamond films on nondiamond substrates are reviewed. Major growth techniques, including hot filament CVD; microwave, RF, or DC plasma enhanced CVD; and combustion flame growth; as well as a number of hybrid and novel approaches, are described and analyzed. Results from the major categories of diamond film characterization, including diamond phase identification, nucleation and interfacial phenomena, morphology, and defects, as well as their correlations with electrical properties, are examined and discussed. Although most of the information presented is equally applicable to protective and wear-resistant coating application, emphasis is placed in the areas most pertinent to microelectronics

Keywords

CVD coatings; diamond; elemental semiconductors; semiconductor thin films; chemical vapor deposition; combustion flame growth; diamond films; electronic applications; hot filament CVD; interfacial phenomena; microelectronics; nucleation; phase identification; plasma enhanced CVD; wear-resistant coating; Chemical vapor deposition; Combustion; Fires; Microwave theory and techniques; Morphology; Plasma chemistry; Plasma properties; Radio frequency; Radiofrequency identification; Substrates;

fLanguage

English

Journal_Title

Proceedings of the IEEE

Publisher

ieee

ISSN

0018-9219

Type

jour

DOI

10.1109/5.90129

Filename

90129