Modeling and measurement of monomer pressure evolution in an inductively coupled pulsed plasma reactor for thin polymer films

Author

Shepsis, Leo V. ; Pedrow, Patrick D. ; Mahalingam, R. ; Osman, Mohamed A.

Author_Institution

Dept. of Chem. Eng., Washington State Univ., Pullman, WA, USA

Volume

28

Issue

6

fYear

2000

fDate

12/1/2000 12:00:00 AM

Firstpage

2172

Lastpage

2178

Abstract

A model has been developed to predict the evolution of monomer pressure over time in an inductively coupled plasma reactor. The model uses an analogous electrical circuit to predict preplasma gas flow conditions. Based on the monomer pressure model, a relationship between pressure prior to electrical discharge and the corresponding plasma polymerized acetylene deposition rate was measured experimentally. A plot of measured deposition rate versus preplasma monomer pressure was observed to have a relative maximum

Keywords

plasma chemistry; plasma materials processing; polymer films; polymerisation; analogous electrical circuit; electrical discharge; inductively coupled pulsed plasma reactor; monomer pressure evolution; monomer pressure model; plasma polymerized acetylene deposition rate; preplasma gas flow conditions; thin polymer films; Chemical engineering; Inductors; Plasma applications; Plasma measurements; Plasma properties; Polymer films; Powders; Predictive models; Pressure measurement; Pulse measurements;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.902244

Filename

902244