DocumentCode
1438164
Title
Plasma effects on electron beam focusing and microwave emission in a virtual cathode oscillator
Author
Yatsuzuka, Mitsuyasu ; Nakayama, Masakazu ; Tanigawa, Mitsuru ; Nobuhara, Sadao ; Young, Douglas ; Ishihara, Osamu
Author_Institution
Dept. of Electr. Eng., Himeji Inst. of Technol., Hyogo, Japan
Volume
26
Issue
4
fYear
1998
fDate
8/1/1998 12:00:00 AM
Firstpage
1314
Lastpage
1321
Abstract
The effect of anode and cathode plasmas on the electron beam dynamics in a virtual cathode oscillator is investigated. A cathode plasma is formed immediately after the rise of the electron beam current and is followed by an anode plasma. The anode plasma formation occurs well before beam focusing and microwave emission. Each plasma expands in the diode region with approximately the speed of 2.0 cm/μs. The electron beam current in the diode region is well characterized by the electron space-charge-limited current in bipolar flow with expanding plasmas in the anode-cathode gap. Particle-in-cell computer simulation reveals that in the presence of anode plasma the annular electron beam is focused down to small radius while oscillating between a real and a virtual cathode. These simulation results agree qualitatively with X-ray measurements of the electron beam current density profile across the anode. Such a focused beam is found to be responsible for the formation of a strong virtual cathode and microwave emission
Keywords
electron beam focusing; microwave generation; plasma simulation; vircators; X-ray measurements; annular electron beam; anode plasmas; anode-cathode gap; bipolar flow; electron beam current; electron beam current density profile; electron beam dynamics; electron beam focusing; electron space-charge-limited current; microwave emission; particle-in-cell computer simulation; plasma effects; virtual cathode oscillator; Anodes; Cathodes; Diodes; Electron beams; Microwave oscillators; Particle beams; Plasma density; Plasma measurements; Plasma simulation; Plasma x-ray sources;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.725164
Filename
725164
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