DocumentCode
1440473
Title
Sheath motion in a capacitively coupled radio frequency discharge
Author
Wood, Blake P. ; Lieberman, Michael A. ; Lichtenberg, Allan J.
Author_Institution
Dept. of Electr. Eng. Comput. Sci., California Univ., Berkeley, CA, USA
Volume
19
Issue
4
fYear
1991
fDate
8/1/1991 12:00:00 AM
Firstpage
619
Lastpage
627
Abstract
The sheath motion in a capacitively coupled RF discharge is highly nonlinear. The voltage waveform on a cylindrical probe placed in the sheath region is measured as a function of position and time. A circuit model of the probe-discharge system relates the observed probe voltage to the sheath motion. The equations derived from this circuit model are solved numerically with varying nonlinear sheath motions; the resulting waveforms are compared with the experimental observations to determine the actual sheath motion. The time-varying plasma potential is also determined, indirectly, from the comparison. The authors also report observation of oscillations related to the plasma frequency, whose peak harmonic component can be calculated from a single plasma model. These oscillations can be a useful plasma diagnostic for determining plasma density. The presence of these high-frequency oscillations may significantly enhance the rate of stochastic heating of electrons
Keywords
high-frequency discharges; plasma sheaths; capacitively coupled radio frequency discharge; circuit model; cylindrical probe; electron heating; highly nonlinear motion; peak harmonic component; probe-discharge system; sheath motion; sheath region; single plasma model; stochastic heating; voltage waveform; Coupling circuits; Plasma density; Plasma diagnostics; Plasma sheaths; Plasma waves; Position measurement; Probes; Radio frequency; Time measurement; Voltage;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.90327
Filename
90327
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