• DocumentCode
    1440532
  • Title

    Wafer fusion of infrared laser diodes to GaN light-emitting heterostructures

  • Author

    Floyd, P.D. ; Chua, C.L. ; Treat, D.W. ; Bour, D.P.

  • Author_Institution
    Electron. Mater. Lab., Xerox Palo Alto Res. Center, CA, USA
  • Volume
    10
  • Issue
    11
  • fYear
    1998
  • Firstpage
    1539
  • Lastpage
    1541
  • Abstract
    We use wafer fusion to integrate AlGaInAs quantum-well (QW) laser heterostructures to GaN laser diode and light-emitting diode (LED) structures. After fusion of the laser heterostructure to the GaN layers, AlGaInAs QW lasers are fabricated and characterized. Lasers of 15×510 μm operate with a threshold of 20 mA and external differential quantum efficiency of 15.5%/facet at a wavelength of 820 nm, InGaN-GaN LED´s, fabricated 75 μm from the lasers, emit at 458 nm. The operation of the lasers and LED´s fused to GaN demonstrates that the fused interface is mechanically robust, and the properties of fused heterostructures are not adversely affected by the fusion process.
  • Keywords
    III-V semiconductors; gallium compounds; indium compounds; integrated optoelectronics; laser transitions; light emitting diodes; optical fabrication; semiconductor lasers; wafer bonding; 15 mum; 458 nm; 510 mum; 820 nm; AlGaInAs; AlGaInAs QW laser fabrication; AlGaInAs quantum-well laser heterostructures; GaN; GaN layers; GaN light-emitting heterostructures; InGaN-GaN; InGaN-GaN LED; LED; external differential quantum efficiency; fused heterostructures; fused interface; fusion process; infrared laser diodes; light-emitting diode; mechanically robust; wafer fusion; Diode lasers; Gallium arsenide; Gallium nitride; Laser fusion; Lattices; Light emitting diodes; Optical materials; Quantum well lasers; Surface emitting lasers; Waveguide lasers;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/68.726742
  • Filename
    726742