• DocumentCode
    1442816
  • Title

    A study on failure prediction in a plasma reactor

  • Author

    Rietman, Edward A. ; Beachy, Milton

  • Author_Institution
    Lucent Technol., AT&T Bell Labs., Murray Hill, NJ, USA
  • Volume
    11
  • Issue
    4
  • fYear
    1998
  • fDate
    11/1/1998 12:00:00 AM
  • Firstpage
    670
  • Lastpage
    680
  • Abstract
    We use several approaches to demonstrate that neural networks can detect precursors to failure. That is, they can detect subtle changes in the process signals. In some cases these subtle changes are early warnings that a subsystem failure is imminent. The results on detection of precursors and faults with various types of time-delay neural networks are discussed. We also measure the noise inherent in our database and place bounds on neural network prediction in the presence of noise. We observe that the noise level can be as high as 40% for detection of failures and can be at 30% to still detect precursors to failure. We note that although self-organizing networks for classification of faults seems like a good idea, in fact they do not perform well in the presence of noise. Lastly, we show that neural networks can induce, or self-build, Markov models from process data and these models can be used to predict system state to a significant distance in the future (e.g., 100 wafers)
  • Keywords
    Markov processes; failure analysis; integrated circuit yield; neural nets; production engineering computing; sputter etching; time series; Markov models; failure prediction; noise level; plasma etching; plasma reactor; process signals; semiconductor processing equipment; subsystem failure; system state; time-delay neural networks; Databases; Fault detection; Inductors; Neural networks; Noise level; Noise measurement; Plasmas; Predictive models; Semiconductor device modeling; Signal processing;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/66.728564
  • Filename
    728564