• DocumentCode
    1454773
  • Title

    A voltage-controlled tunable thin-film distributed RC notch filter

  • Author

    Choi, Won-Youl ; Trolier-McKinstry, Susan

  • Author_Institution
    MEMS Lab., Samsung Adv. Inst. of Technol., Suwon, South Korea
  • Volume
    24
  • Issue
    1
  • fYear
    2001
  • fDate
    3/1/2001 12:00:00 AM
  • Firstpage
    33
  • Lastpage
    37
  • Abstract
    Notch filters are widely used in communication and instrumentation systems not only for eliminating undesired frequencies and for measuring transient harmonic distortions, but also as central components of selective filters and oscillators in feedback arrangements. This paper describes the characteristics of a thin-film distributed RC (DRC) notch filter made from Au/TaN/Y-doped BaTiO3 (Y-BT)/Pt. The dielectric (Y-BT) and resistive (TaN) films were grown by pulsed laser deposition (PLD). A notch frequency of 2.8 MHz and notch depth of -76.7 dB were measured from zero with a notch resistance (RN) of 34 Ω. The experimental optimum notch parameters of α=R/RN =19.7 and xn=ω/ω0=33.0 were obtained. Tunability of the notch frequency was observed with an applied DC bias voltage
  • Keywords
    RC circuits; active filters; barium compounds; circuit feedback; circuit tuning; distributed parameter filters; gold; notch filters; pulsed laser deposition; tantalum compounds; thin film circuits; transfer functions; 2.8 MHz; 34 ohm; Au-TaN-BaTiO3:Y; Curie constant; applied DC bias voltage; dielectric constant; dissipation factors; notch depth; notch frequency; notch resistance; optimum notch parameters; pulsed laser deposition; selective filters; thin-film distributed RC notch filter; voltage transfer function; voltage-controlled tunable; Dielectric measurements; Dielectric thin films; Filters; Frequency measurement; Instruments; Laser feedback; Pulsed laser deposition; Transistors; Tunable circuits and devices; Voltage;
  • fLanguage
    English
  • Journal_Title
    Components and Packaging Technologies, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1521-3331
  • Type

    jour

  • DOI
    10.1109/6144.910799
  • Filename
    910799