• DocumentCode
    1454941
  • Title

    Effects of Design Geometries and Nonlinear Losses on Gain in Silicon Waveguides With Erbium-Doped Regions

  • Author

    Qian, Feng ; Song, Qi ; Tien, En-Kuang ; Kalyoncu, Salih K. ; Huang, Yuewang ; Boyraz, Ozdal

  • Author_Institution
    Electr. & Comput. Sci. Dept., Univ. of California, Irvine, CA, USA
  • Volume
    47
  • Issue
    3
  • fYear
    2011
  • fDate
    3/1/2011 12:00:00 AM
  • Firstpage
    327
  • Lastpage
    334
  • Abstract
    Silicon waveguides integrated with doped dielectric gain media may allow the design of planar light sources with electronic control. In this paper, the effects of design geometries and nonlinear losses on the gain in crystalline silicon waveguides with erbium-doped regions are investigated. We show that by using multitrench geometries, the power confinement can be increased and higher gain-to-nonlinear-loss ratio achieved. Net gain can be improved as much as 0.38 dB/cm in multitrench waveguides compared to single-trench waveguides.
  • Keywords
    elemental semiconductors; erbium; integrated optics; nonlinear optics; optical design techniques; optical losses; optical waveguides; silicon; JkJk:Er-Si; design geometries; doped dielectric gain media; electronic control; erbium doping; gain-to-nonlinear-loss ratio; integrated silicon waveguides; multitrench geometries; multitrench waveguides; nonlinear losses; planar light sources; power confinement; single-trench waveguides; Absorption; Aluminum oxide; Erbium; Gain; Geometry; Optical waveguides; Silicon; Erbium; integrated optics; laser amplifiers; waveguides;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/JQE.2010.2088379
  • Filename
    5716920