DocumentCode
1454941
Title
Effects of Design Geometries and Nonlinear Losses on Gain in Silicon Waveguides With Erbium-Doped Regions
Author
Qian, Feng ; Song, Qi ; Tien, En-Kuang ; Kalyoncu, Salih K. ; Huang, Yuewang ; Boyraz, Ozdal
Author_Institution
Electr. & Comput. Sci. Dept., Univ. of California, Irvine, CA, USA
Volume
47
Issue
3
fYear
2011
fDate
3/1/2011 12:00:00 AM
Firstpage
327
Lastpage
334
Abstract
Silicon waveguides integrated with doped dielectric gain media may allow the design of planar light sources with electronic control. In this paper, the effects of design geometries and nonlinear losses on the gain in crystalline silicon waveguides with erbium-doped regions are investigated. We show that by using multitrench geometries, the power confinement can be increased and higher gain-to-nonlinear-loss ratio achieved. Net gain can be improved as much as 0.38 dB/cm in multitrench waveguides compared to single-trench waveguides.
Keywords
elemental semiconductors; erbium; integrated optics; nonlinear optics; optical design techniques; optical losses; optical waveguides; silicon; JkJk:Er-Si; design geometries; doped dielectric gain media; electronic control; erbium doping; gain-to-nonlinear-loss ratio; integrated silicon waveguides; multitrench geometries; multitrench waveguides; nonlinear losses; planar light sources; power confinement; single-trench waveguides; Absorption; Aluminum oxide; Erbium; Gain; Geometry; Optical waveguides; Silicon; Erbium; integrated optics; laser amplifiers; waveguides;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.2010.2088379
Filename
5716920
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