• DocumentCode
    1458666
  • Title

    Performance Improvement Versus CPW and Loss Distribution Analysis of Slow-Wave CPW in 65 nm HR-SOI CMOS Technology

  • Author

    Tang, Xiao-Lan ; Franc, Anne-Laure ; Pistono, Emmanuel ; Siligaris, Alexandre ; Vincent, Pierre ; Ferrari, Philippe ; Fournier, Jean-Michel

  • Author_Institution
    Inst. of Microelectron. Electromagn. & Photonic (IMEP-LAHC), Grenoble, France
  • Volume
    59
  • Issue
    5
  • fYear
    2012
  • fDate
    5/1/2012 12:00:00 AM
  • Firstpage
    1279
  • Lastpage
    1285
  • Abstract
    High-performance integrated slow-wave coplanar waveguides (S-CPW) are compared with conventional coplanar waveguides (CPW) fabricated in a 65-nm High-Resistivity-SOI (HR-SOI) CMOS technology. As expected, S-CPW demonstrates better performance at millimeter-wave frequencies in term of higher effective dielectric permittivity, which is due to the patterned floating shield inserted between the transmission line and the substrate. In addition, S-CPW shows a lower attenuation constant despite of the added metallic patterned floating shield on HR substrate. For demonstration purpose, both low- and high- characteristic impedance S-CPW and CPW are characterized. For 28-Ω S-CPW and 65-Ω S-CPW, the effective dielectric permittivity is improved by a factor of 6 and 2, respectively. Meanwhile, attenuation constants of slow-wave structures are lower than 0.9 dB/mm and 0.57 dB/mm at 60 GHz, compared to CPW ones which are as high as 1.5 dB/mm and 0.95 dB/mm, respectively. Furthermore, the loss distribution for the S-CPW structure is detailed by varying the patterned floating shield length for both standard Bulk and HR-SOI substrates.
  • Keywords
    CMOS integrated circuits; coplanar transmission lines; coplanar waveguides; silicon-on-insulator; slow wave structures; HR-SOI CMOS technology; HR-SOI substrates; dielectric permittivity; high-performance integrated S-CPW; high-performance integrated slow-wave coplanar waveguides; high-resistivity silicon-on-insulator CMOS technology; loss distribution analysis; metallic patterned floating shield; millimeter-wave frequencies; resistance 28 ohm; resistance 65 ohm; size 65 nm; slow-wave structures; transmission line; Attenuation; Coplanar waveguides; Dielectrics; Eddy currents; Permittivity; Strips; Substrates; CMOS integrated circuit; millimeter-wave; silicon on insulator; slow-wave coplanar waveguides (CPW);
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2012.2186969
  • Filename
    6158625