• DocumentCode
    1458970
  • Title

    Optoelectrical Detection System Using Porous Silicon-Based Optical Multilayers

  • Author

    Kovacs, Andras ; Jonnalagadda, Prasad ; Mescheder, Ulrich

  • Author_Institution
    Inst. for Appl. Res., Hochschule Furtwangen Univ., Furtwangen, Germany
  • Volume
    11
  • Issue
    10
  • fYear
    2011
  • Firstpage
    2413
  • Lastpage
    2420
  • Abstract
    Porous silicon-based multilayer structures for optical sensors have been simulated, fabricated and tested. The properties of optical sensors using porous silicon multilayers can be adjusted by appropriate substrate material, morphology, process parameters in the pore formation process and by surface treatment (thermal oxidation). Heavily and lightly doped p-doped substrates have been used to realize porous silicon layers with different morphology, porosity (30%-80%), pore size (mesoporous range) and specific surface area (200-700 m2/cm3). Thermal oxidation stabilizes the surface and results in hydrophilic surfaces for effective adsorption of liquid analytes. Oxidation reduces the porosity and the pore size but improves the wetting behavior of liquid analytes in the porous volume. Different multilayer structures using native and oxidized porous silicon and corresponding concepts of optical sensor systems have been proved for aqueous and organic analytes. Sensors using small pore size (2-4 nm) and high porosity (70%-80%) have been realized and characterized. A simple, low cost optical sensor system based on multilayer, a LED-based illumination system providing discrete wavelengths (RGB) and a wide band detector has been realized and tested.
  • Keywords
    elemental semiconductors; light emitting diodes; optical multilayers; optical sensors; oxidation; photoelectric devices; porous semiconductors; silicon; surface treatment; LED based illumination system; Si; discrete wavelengths; optical sensors; optoelectrical detection system; pore formation process; porous silicon based multilayer structure; porous silicon based optical multilayers; size 2 nm to 4 nm; surface treatment; thermal oxidation; wide band detector; Current density; Distributed Bragg reflectors; Nonhomogeneous media; Oxidation; Refractive index; Silicon; Surface morphology; Optical multilayer; optoelectronic and photonic sensors; porous silicon; refractive index;
  • fLanguage
    English
  • Journal_Title
    Sensors Journal, IEEE
  • Publisher
    ieee
  • ISSN
    1530-437X
  • Type

    jour

  • DOI
    10.1109/JSEN.2011.2119310
  • Filename
    5720253