DocumentCode
1461993
Title
Curve evolution models for real-time identification with application to plasma etching
Author
Berg, Jordan ; Yezzi, Anthony ; Tannenbaum, Allen
Author_Institution
Dept. of Mech. Eng., Texas Tech. Univ., Lubbock, TX, USA
Volume
44
Issue
1
fYear
1999
Firstpage
99
Lastpage
102
Abstract
It is desirable, in constructing an algorithm for real-time control or identification of free surfaces, to avoid representations of the surface requiring mesh refinement at corners or special logic for topological transitions. Level set methods provide a promising framework for such algorithms. In this paper we present: 1) a mathematical representation of free surface motion that is particularly well-suited to real-time implementation; 2) a technique for estimating an isotropic and homogeneous normal velocity based on a simple measurement; and 3) an application to a semiconductor etching problem.
Keywords
parameter estimation; process control; real-time systems; semiconductor device manufacture; sputter etching; curve evolution; free surface motion; identification; level set method; parameter estimation; plasma etching; process modelling; real-time systems; semiconductor manufacturing; Etching; Level set; Logic; Motion estimation; Motion measurement; Parameter estimation; Particle measurements; Plasma applications; Plasma measurements; Velocity measurement;
fLanguage
English
Journal_Title
Automatic Control, IEEE Transactions on
Publisher
ieee
ISSN
0018-9286
Type
jour
DOI
10.1109/9.739081
Filename
739081
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