• DocumentCode
    1461993
  • Title

    Curve evolution models for real-time identification with application to plasma etching

  • Author

    Berg, Jordan ; Yezzi, Anthony ; Tannenbaum, Allen

  • Author_Institution
    Dept. of Mech. Eng., Texas Tech. Univ., Lubbock, TX, USA
  • Volume
    44
  • Issue
    1
  • fYear
    1999
  • Firstpage
    99
  • Lastpage
    102
  • Abstract
    It is desirable, in constructing an algorithm for real-time control or identification of free surfaces, to avoid representations of the surface requiring mesh refinement at corners or special logic for topological transitions. Level set methods provide a promising framework for such algorithms. In this paper we present: 1) a mathematical representation of free surface motion that is particularly well-suited to real-time implementation; 2) a technique for estimating an isotropic and homogeneous normal velocity based on a simple measurement; and 3) an application to a semiconductor etching problem.
  • Keywords
    parameter estimation; process control; real-time systems; semiconductor device manufacture; sputter etching; curve evolution; free surface motion; identification; level set method; parameter estimation; plasma etching; process modelling; real-time systems; semiconductor manufacturing; Etching; Level set; Logic; Motion estimation; Motion measurement; Parameter estimation; Particle measurements; Plasma applications; Plasma measurements; Velocity measurement;
  • fLanguage
    English
  • Journal_Title
    Automatic Control, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9286
  • Type

    jour

  • DOI
    10.1109/9.739081
  • Filename
    739081