• DocumentCode
    1464693
  • Title

    Characterization of nonlinear substrate resistance in short-channel MOSFETs

  • Author

    Mihnea, Andrei ; Georgescu, Sorin S.

  • Author_Institution
    Catalyst Semiconductor Inc., Sunnyvale, CA, USA
  • Volume
    43
  • Issue
    12
  • fYear
    1996
  • fDate
    12/1/1996 12:00:00 AM
  • Firstpage
    2177
  • Lastpage
    2184
  • Abstract
    The substrate current conduction in the short-channel MOSFET is described as a virtual JFET coupled with the intrinsic MOSFET. A method to extract the I-V characteristics of the substrate-JFET from I-V measurements on the MOSFET, and pertinent results for a few varied MOSFET structures are presented. The JFET model and characteristics appear valid for the structures investigated, and reveal the fact that modulation by the depletion regions of the source and drain junctions is a major factor in the nonlinearity of the substrate resistance of actual MOSFETs. The nonlinearity of the substrate resistance needs to be considered for an accurate description of the drain-voltage induced limitation of a standard MOSFET. Also, the pinch-off of the substrate-JFET offers a physical explanation to the “early” turn on, a type of drain-voltage limitation present in the short-channel MOSFET when the depletion regions of the source and drain merge in the depth of the channel
  • Keywords
    MOSFET; semiconductor device models; substrates; JFET model; depletion region; drain-voltage limitation; early turn on; nonlinear substrate resistance; pinch-off; short-channel MOSFET; Current measurement; Electrical resistance measurement; FETs; Helium; MOSFET circuits; Substrates; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.544389
  • Filename
    544389