DocumentCode
1464693
Title
Characterization of nonlinear substrate resistance in short-channel MOSFETs
Author
Mihnea, Andrei ; Georgescu, Sorin S.
Author_Institution
Catalyst Semiconductor Inc., Sunnyvale, CA, USA
Volume
43
Issue
12
fYear
1996
fDate
12/1/1996 12:00:00 AM
Firstpage
2177
Lastpage
2184
Abstract
The substrate current conduction in the short-channel MOSFET is described as a virtual JFET coupled with the intrinsic MOSFET. A method to extract the I-V characteristics of the substrate-JFET from I-V measurements on the MOSFET, and pertinent results for a few varied MOSFET structures are presented. The JFET model and characteristics appear valid for the structures investigated, and reveal the fact that modulation by the depletion regions of the source and drain junctions is a major factor in the nonlinearity of the substrate resistance of actual MOSFETs. The nonlinearity of the substrate resistance needs to be considered for an accurate description of the drain-voltage induced limitation of a standard MOSFET. Also, the pinch-off of the substrate-JFET offers a physical explanation to the “early” turn on, a type of drain-voltage limitation present in the short-channel MOSFET when the depletion regions of the source and drain merge in the depth of the channel
Keywords
MOSFET; semiconductor device models; substrates; JFET model; depletion region; drain-voltage limitation; early turn on; nonlinear substrate resistance; pinch-off; short-channel MOSFET; Current measurement; Electrical resistance measurement; FETs; Helium; MOSFET circuits; Substrates; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.544389
Filename
544389
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