• DocumentCode
    1466050
  • Title

    Methodology of Statistical RTS Noise Analysis With Charge-Carrier Trapping Models

  • Author

    Tang, Tong Boon ; Murray, Alan F. ; Roy, Scott

  • Author_Institution
    Sch. of Electron. & Eng., Univ. of Edinburgh, Edinburgh, UK
  • Volume
    57
  • Issue
    5
  • fYear
    2010
  • fDate
    5/1/2010 12:00:00 AM
  • Firstpage
    1062
  • Lastpage
    1070
  • Abstract
    Random telegraph signal (RTS) noise has shown an increased impact on circuit performance at advanced complementary metal-oxide-semiconductor technologies. However, there is not yet a computer-aided design tool available to analyze such noise based on the statistical distribution of traps. In this paper, a new methodology is proposed to enable integrated circuit designers to analyze their circuits in the presence of RTS noise, thus providing an opportunity to mitigate the noise effect by design. Using a 3-D atomistic simulator, compact models that could accurately describe the device structure, doping profile, and statistically representative distribution of traps were extracted for SPICE simulation. Carrier trapping/detrapping was represented by a pair of compact models at different threshold voltages, hence defining the amplitude of RTS noise. The timing parameters of RTS noise were predicted based on the Shockley-Read-Hall statistics. Simulation results reveals that, while RTS noise from a single device may have little impact (??I out ?? 0.0842 ??A) on our test circuit performance, the cumulative effect from all devices (n = 30) in this relatively small circuit can be significant (??I out ?? 0.5766 ??A) . This reinforces the need for an RTS noise analyzer for deep-submicrometer circuit designs.
  • Keywords
    CMOS integrated circuits; SPICE; integrated circuit noise; random noise; 3-D atomistic simulator; CMOS technologies; SPICE simulation; Shockley-Read-Hall statistics; carrier detrapps; carrier traps; charge-carrier trapping models; complementary metal-oxide-semiconductor technologies; deep-sub- micrometer circuit designs; doping profile; noise effect; random telegraph signal noise; statistical RTS noise analysis; statistically representative distribution; Design for signal integrity; device variability; nanoscale metal–oxide–semiconductor field-effect transistors (MOSFETs); random telegraph signal (RTS) noise;
  • fLanguage
    English
  • Journal_Title
    Circuits and Systems I: Regular Papers, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1549-8328
  • Type

    jour

  • DOI
    10.1109/TCSI.2010.2043988
  • Filename
    5444909