• DocumentCode
    1476174
  • Title

    Scaling of Hydrogen-Terminated Diamond FETs to Sub-100-nm Gate Dimensions

  • Author

    Moran, David A J ; Fox, Oliver J L ; McLelland, Helen ; Russell, Stephen ; May, Paul W.

  • Author_Institution
    Sch. of Eng., Univ. of Glasgow, Glasgow, UK
  • Volume
    32
  • Issue
    5
  • fYear
    2011
  • fDate
    5/1/2011 12:00:00 AM
  • Firstpage
    599
  • Lastpage
    601
  • Abstract
    We present the dc operation of hydrogen-terminated diamond field-effect transistors (FETs) with gate lengths of 1 μm to 50 nm. The 50-nm device metrics include a maximum drain current of 290 mA/mm and a peak extrinsic transconductance of 95 mS/mm. As the device gate length is reduced, peak intrinsic transconductance is increased substantially to a value of 650 mS/mm for the 50-nm device. A minimum Ion/Ioff ratio of ~ 1.5 × 104 is maintained at this reduced gate dimension. These results appear highly promising for the improvement of hydrogen-terminated diamond FET high-frequency performance through reduction of the device gate length to sub-100-nm dimensions.
  • Keywords
    diamond; field effect transistors; field-effect transistor; gate dimension; gate length; hydrogen-terminated diamond FET; maximum drain current; peak extrinsic transconductance; size 1 mum to 50 nm; size 100 nm; Diamond-like carbon; FETs; Logic gates; Ohmic contacts; Performance evaluation; Resistance; Transconductance; Diamond; field-effect transistor (FET); hydrogen terminated; scaling;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2011.2114871
  • Filename
    5735184