Properties of NbTiN thin films prepared by reactive DC magnetron sputtering

Author

Myoren, Hiroaki ; Shimizu, Takayuki ; Iizuka, Takeshi ; Takada, Susumu

Author_Institution

Fac. of Eng., Saitama Univ., Urawa, Japan

Volume

11

Issue

1

fYear

2001

fDate

3/1/2001 12:00:00 AM

Firstpage

3828

Lastpage

3831

Abstract

We have prepared Nb_1-xTi_xN (NbTiN) thin films by reactive dc magnetron sputtering without intentional heating. Superconducting properties were strongly related to sputtering conditions. Lattice parameters of NbTiN films approached that of bulk NbTiN on decreasing the N₂ mole fraction in Ar and N₂ sputtering gas mixture. The film orientation was also strongly related to the sputtering conditions such as gas pressure. NbN thin films could grow epitaxially on MgO(100) substrates and showed very smooth surfaces. We found that smooth NbTiN films could be obtained on MgO(100) substrates with an epitaxially grown NbN template layer

Keywords

lattice constants; niobium compounds; sputter deposition; superconducting thin films; superconducting transition temperature; surface structure; titanium compounds; MgO; MgO(100) substrates; N₂ mole fraction; NbTiN; epitaxially grown NbN template layer; film orientation; gas pressure; lattice parameters; reactive DC magnetron sputtering; thin films; Heating; Magnetic properties; Niobium; Sputtering; Substrates; Superconducting epitaxial layers; Superconducting films; Superconducting magnets; Superconducting thin films; Transistors;

fLanguage

English

Journal_Title

Applied Superconductivity, IEEE Transactions on

Publisher

ieee

ISSN

1051-8223

Type

jour

DOI

10.1109/77.919899

Filename

919899