• DocumentCode
    1482188
  • Title

    Parameter extraction method for universal amorphous silicon thin-film transistors simulation program with integrated circuit emphasis model

  • Author

    Jin, Jong W. ; Oudwan, M. ; Daineka, Dmitri ; Moustapha, O. ; Bonnassieux, Yvan

  • Author_Institution
    LPICM, Ecole Polytech., Palaiseau, France
  • Volume
    6
  • Issue
    2
  • fYear
    2012
  • fDate
    3/1/2012 12:00:00 AM
  • Firstpage
    118
  • Lastpage
    121
  • Abstract
    The universal simulation program with integrated circuit emphasis (SPICE) model for hydrogenated amorphous silicon thin-film transistor is largely used in circuit simulation. This model has more than 10 parameters to be extracted through experimental data, and the optimal method to determine them is still open to discussion. In this study, the authors propose a new method for the extraction of the main above-threshold regime parameters. This method can be used regardless of the resistance value between the channel and the source-drain. The parameters extracted with this method are less sensitive on experimental data selection than the ones obtained through conventional methods. In addition, these parameters successfully describe the experimental data.
  • Keywords
    SPICE; amorphous semiconductors; circuit simulation; elemental semiconductors; hydrogenation; semiconductor thin films; silicon; thin film transistors; Si; above-threshold regime parameters extraction; circuit simulation; experimental data selection; hydrogenated amorphous silicon thin-film transistors SPICE model; simulation program with integrated circuit emphasis model; source-drain channel;
  • fLanguage
    English
  • Journal_Title
    Circuits, Devices & Systems, IET
  • Publisher
    iet
  • ISSN
    1751-858X
  • Type

    jour

  • DOI
    10.1049/iet-cds.2011.0124
  • Filename
    6177332